LAYER CONFIGURATION WITH IMPROVED STABILITY TO SUNLIGHT EXPOSURE

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United States of America Patent

APP PUB NO 20080290324A1
SERIAL NO

11934385

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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A composition exclusive of hydroquinone comprising at least one polymer comprising (3,4-dialkoxythiophene) monomer units, in which the two alkoxy groups may be the same or different or together represent an optionally substituted oxy-alkylene-oxy bridge, a polyanion, at least one aromatic compound exclusive of sulfo groups and containing at least two hydroxy groups and at least one polyhydroxy- and/or carboxy group or amide or lactam group containing aliphatic compound and/or at least one aprotic compound with a dielectric constant .gtoreq.15; and a layer configuration on a support, said layer configuration comprising a layer exclusive of hydroquinone comprising at least one polymer comprising optionally substituted (3,4-dialkoxythiophene) monomer units, in which the two alkoxy groups may be the same or different or together represent an optionally substituted oxy-alkylene-oxy bridge, a polyanion, at least one aromatic compound exclusive of sulfo groups and containing at least two hydroxy groups and at least one polyhydroxy- and/or carboxy group or amide or lactam group containing aliphatic compound and/or at least one aprotic compound with a dielectric constant .gtoreq.15.

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Patent Owner(s)

Patent OwnerAddress
AGFA-GEVAERT N VSEPTESTRAAT 27 MORTSEL B-264

International Classification(s)

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Bollens, Louis Begijnendijk, BE 4 28
LOUWET, FRANK Diepenbeek, BE 53 765

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