Fluorinated half ester of maleic anhydride polymers for dry 193 nm top antireflective coating application
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United States of America Patent
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Jul 13, 2010
Grant Date -
Nov 20, 2008
app pub date -
Jul 21, 2008
filing date -
Jun 21, 2006
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Abstract
The present invention discloses a composition suitable for use as a top antireflective coating and barrier layer for 193 nm lithography. The inventive composition is soluble in aqueous base solutions and has low refractive index at 193 nm. The inventive composition comprises an aqueous base-soluble polymer having a backbone and a fluorinated half ester moiety. The fluorinated half ester moiety is pendant from the backbone. The present invention also discloses a method of forming a patterned layer on a substrate by using the inventive composition in lithography.
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