ETCHING GAS CONTROL SYSTEM
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United States of America Patent
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N/A
Issued Date -
Nov 6, 2008
app pub date -
Apr 2, 2008
filing date -
May 4, 2007
priority date (Note) -
Abandoned
status (Latency Note)
Importance
Abstract
An etching gas control system is provided. The system includes a gas injector, a gas supply pipe, a Flow Ratio Controller (FRC), and a gas supply unit. The gas injector is installed in a chamber and supplies gas inside the chamber. The gas injector includes a top injector installed at a top of the chamber and a side injector installed at a side of the chamber. The gas supply pipe connects and supplies gas to the gas injector. The FRC connects to the gas supply pipe and controls supply of gas. The gas supply unit supplies gas to the FRC.
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