Embossing Device with a Deflection Compensated Roller
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United States of America Patent
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Issued Date -
Oct 16, 2008
app pub date -
Aug 5, 2005
filing date -
Aug 13, 2004
priority date (Note) -
Abandoned
status (Latency Note)
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Abstract
A diffractive microstructure is produced on the surface layer of a substrate using an embossing device. The embossing device includes an embossing roll and a backing roll for exerting an embossing pressure on the surface layer of the substrate. The embossing pressure and/or variations in temperature cause deflection of the embossing roll. To compensate for the deflection, the embossing device can set the embossing pressure exerted by the central area of the embossing roll on the surface layer of the substrate to be at least equal to or higher than the embossing pressure exerted by the end areas of the embossing roll on the surface layer of the substrate.
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