Cvd-Reactor with Slidingly Mounted Susceptor Holder
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United States of America Patent
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Issued Date -
Oct 16, 2008
app pub date -
Nov 17, 2006
filing date -
Nov 19, 2005
priority date (Note) -
Abandoned
status (Latency Note)
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Abstract
The invention relates to a device for depositing at least one layer on a substrate having one or more susceptors (7) for receiving substrates, comprising a substrate holder (6) that can be rotatably driven and forms the bottom of a process chamber (2), a RF heating system (22) disposed below the susceptor holder (6) and a gas inlet element (4) for introducing process gases into the process chamber. In order to further develop the generic device and to improve the production and advantages of use, it is proposed that the susceptor holder (6) lies in a sliding manner on an essentially IR- and/or RF-permeable supporting plate (14).
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