Photomask and Method for Forming a Non-Orthogonal Feature on the Same
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United States of America Patent
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Issued Date -
Oct 9, 2008
app pub date -
Sep 6, 2006
filing date -
Sep 7, 2005
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Abandoned
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Abstract
A photomask and method for forming a non-orthogonal feature on the photomask are provided. A method for forming a non-orthogonal feature on a photomask blank includes providing a mask layout file including a primitive shape and fracturing the primitive shape to create a plurality of writeable shapes in a mask pattern file. A non-orthogonal feature formed by the writeable shapes is formed on a photomask blank by using a lithography system to image the writeable shapes from the mask pattern file onto a resist layer of the photomask blank.
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