SCANNING PROBE MICROSCOPE AND MEASUREMENT METHOD OF SAME

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United States of America Patent

APP PUB NO 20080245139A1
SERIAL NO

12061308

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Abstract

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A measurement method of a scanning probe microscope including a first approach operation adjusting an operation position of a fine positioning unit to near a maximum extension amount and ending the approach by coarse positioning, a first measurement operation making the probe scan the surface for measurement in a close probe state based on the first approach operation to obtain relief information of the sample surface, a positioning operation positioning the probe at a recessed part based on the relief information obtained by the first measurement operation, a second approach operation making the probe again approach the surface at a position determined by the positioning operation, adjusting an operation position of the Z-axis fine positioning device to close to a maximum extension amount, and ending the repeated approach, and a second measurement operation making the probe scan the surface for measurement in a close probe state based on the second approach operation to obtain relief information of the sample surface.

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Patent Owner(s)

Patent OwnerAddress
HITACHI KENKI FINE TECH CO LTD19-11 YUSHIMA 3-CHOME BUNKYO-KU TOKYO

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Baba, Shuichi Tsuchiura-shi, JP 19 145
Edamura, Manabu Tsuchiura-shi, JP 76 793
Kembo, Yukio Tsuchiura-shi, JP 39 1223
Kurenuma, Toru Tsuchiura-shi, JP 12 191
Kuroda, Hiroshi Tsuchiura-shi, JP 127 2587
Morimoto, Takafumi Tsuchiura-shi, JP 22 370
Watanabe, Masahiro Tsuchiura-shi, JP 569 7223

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