METHOD FOR PRODUCING HYDROGEN GAS SEPARATION MATERIAL
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
N/A
Issued Date -
Oct 2, 2008
app pub date -
Mar 27, 2008
filing date -
Mar 29, 2007
priority date (Note) -
Abandoned
status (Latency Note)
Importance
Abstract
The invention provides a method for consistently producing a hydrogen gas separator with a good performance balance. The method includes the process for preparing a porous substrate and the process for forming a silica coat on the substrate by chemical vapor deposition in which a reaction is brought about between a silica source provided to one side of the substrate and an oxygen-containing gas supplied to the other side of the substrate. The vapor deposition process is carried out using as the silica source a silicon compound (a) with Si-Z-Si bonds (Z is O or N) in the molecule.
First Claim
Family
International Classification(s)
Cited Art Landscape
Patent Citation Ranking
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully