POLISHING PAD HAVING SURFACE TEXTURE

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United States of America Patent

SERIAL NO

12124594

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Abstract

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The present invention relates to a polishing pad having a surface texture. The surface texture is disposed on the polishing surface of the polishing pad. The surface texture comprises at least one first groove, at least one second groove, and a plurality of holes. The second groove extends from a central portion of the polishing pad to the edge of the polishing pad, and the first groove(s) is intersected with the second groove(s) to form a plurality of intersection points. The holes are disposed at the intersection points, and the depth of the holes is larger than that of the first groove. Thus, the second groove(s) enables impurities suspended in the polishing slurry to be quickly removed from the polishing pad, and the holes can store the polishing slurry to delay the polishing particles in the polishing slurry from departing from the polishing pad.

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Patent Owner(s)

Patent OwnerAddress
SAN FANG CHEMICAL INDUSTRY CO LTD402 FENGJEN RD JENWU DIST KAOHSIUNG CITY

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
CHAO, Chen-Hsiang Kaohsiung, TW 19 66
FENG, Chung-Chih Kaohsiung, TW 112 308
SUNG, Kun-Cheng Kaohsiung, TW 3 34
YAO, I-Peng Kaohsiung, TW 79 189

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