METHOD AND APPARATUS FOR MANUFACTURING A SUBSTRATE WITH A MAGNETRON SPUTTER COATING
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United States of America Patent
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Issued Date -
Sep 4, 2008
app pub date -
Apr 8, 2008
filing date -
Oct 15, 2002
priority date (Note) -
Abandoned
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Abstract
Manufacturing a coated substrate by magnetron sputtering includes cyclically moving the magnetron magnetic field pattern along a sputter surface, positioning a substrate to be coated a distance from and facing the sputter surface, moving the substrate along the sputter surface and varying an amount of material deposited on the total substrate per time unit from the magnetron source that is cyclically and phase-locked with the cyclically moving magnetron magnetic field pattern.
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