Damper
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United States of America Patent
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N/A
Issued Date -
Sep 4, 2008
app pub date -
May 16, 2006
filing date -
May 17, 2005
priority date (Note) -
Abandoned
status (Latency Note)
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Abstract
A damper that has chemical resistance, that can be used under a high-pressure environment, and that can remove pressure pulsations is provided. This damper includes a fluid chamber into and out of which a fluid flows, a diaphragm defining at least one surface of the fluid chamber, and a separate chamber adjacent to the fluid chamber in a fluid-tight manner, with the diaphragm disposed therebetween. The diaphragm includes a first film having chemical resistance and a second film having pressure resistance.
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