PROCESSING SYSTEM WITH IN-SITU CHEMICAL SOLUTION GENERATION
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United States of America Patent
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Issued Date -
Aug 28, 2008
app pub date -
Feb 27, 2007
filing date -
Feb 27, 2007
priority date (Note) -
Abandoned
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Abstract
A system for processing a workpiece includes a dry process chamber, such as a plasma etching chamber, and a wet process chamber, such as a spin/spray chamber. Gas supply lines supply gases to the dry process chamber, and to a chemical solution generator. A liquid supply line supplies a liquid, such as de-ionized water, to the chemical solution generator. The chemical solution generator manufactures liquid chemical solutions in situ, for point of use in the wet process chamber. The system allows for both wet and dry processing with few or no separate liquid chemical supply lines.
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