Method and system for reticle scheduling
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United States of America Patent
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Issued Date -
Aug 21, 2008
app pub date -
Feb 20, 2007
filing date -
Feb 20, 2007
priority date (Note) -
Abandoned
status (Latency Note)
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Abstract
Methods and systems for reticle scheduling in semiconductor manufacturing providing a trade-off between complying with level priority and maximizing scanner utilization for critical scanners as a whole is disclosed. The extent of trade-off is specified by user, depending on scanner excess capacity. The method invented comprises, first, the steps of an initialization block performing splitting planning horizon into time buckets, initialization of system variables, and reading data on work-in-process, scanner/reticle status and reticle locations. The following block determines which buckets to run optimization for. The next method block is building a network for optimization based on inputs from inline real-time dispatching (RTD) followed by running optimization of the network. The last method block updates WIP and reticle information based on optimization results and feeds the results into a wafer lot assignment system.
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