Carrier film for mounting polishing workpiece and method for making the same

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United States of America Patent

APP PUB NO 20080200105A1
SERIAL NO

11706226

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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The present invention relates to a carrier film for mounting a polishing workpiece. The carrier film comprises a surface substrate and a buffer substrate. The surface substrate comprises holes, and the material of the surface substrate comprises elastomer. The buffer substrate comprises holes, and the material of the buffer substrate comprises the elastomer. The surface substrate and the buffer substrate are adhered with adhesive comprising the elastomer. A method for making the carrier film is also provided. When polishing, the carrier film provides a good buffer property to conduct and release down force applied on the polishing workpiece.

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Patent Owner(s)

Patent OwnerAddress
SAN FANG CHEMICAL INDUSTRY CO LTDKAOHSIUNG CITY

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Feng, Chung-Chih Kaohsiung, TW 112 308
Hung, Yung-Chang Kaohsiung, TW 45 119
Wang, Lyang-Gung Kaohsiung, TW 21 42
Yao, I-Peng Kaohsiung, TW 79 189

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