PHOTOSENSITIVE COMPOSITIONS EMPLOYING SILICON-CONTAINING ADDITIVES

United States of America Patent

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Issued Date
Aug 21, 2008
app pub date
Feb 8, 2008
filing date
Feb 8, 2007

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Abandoned

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Abstract

A photosensitve composition exhibiting high resolution and enhanced, tunable O.sub.2 plasma etch resistance comprising a silicon-containing base polymer, a silicon-containing additive, a photoacid generator and solvent is provided. A method of forming a patterned resist film is also provided.

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Patent Owner(s)

Patent Owner	Address
FUJIFILM ELECTRONIC MATERIALS U S A INC	80 CIRCUIT DRIVE NORTH KINGSTOWN RI 02852

International Classification(s)

G03F:PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNE....

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[Patents Count]

Inventor(s)

Inventor Name	Address	# of filed Patents	Total Citations
DE, BINOD B	Attleboro, MA	38	146
DIMOV, OGNIAN N	Warwick, RI	15	71
MALIK, SANJAY	Attleboro, MA	54	364
RUSHKIN, IL'YA	Acton, MA	7	59

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PHOTOSENSITIVE COMPOSITIONS EMPLOYING SILICON-CONTAINING ADDITIVES

Number of patents in Portfolio can not be more than 2000

United States of America Patent

12028512

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SERIAL NO	12028512
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12028512

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