Hard Material Layer
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United States of America Patent
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app pub date -
Jan 19, 2006
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Mar 24, 2005
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Abstract
A hard material layer is deposited on a workpiece as a functional layer by an arc-PVD method. The layer is essentially an electrically insulating oxide of at least one of the metals (Me) of the transition metals of the sub-groups IV, V, VI of the periodic table and Al, Si, Fe, Co, Ni, Co, or Y and the functional layer (32) contains no noble gas or halogen.
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