Apparatus for real-time dynamic chemical analysis
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United States of America Patent
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app pub date -
Feb 7, 2008
filing date -
Sep 25, 2001
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Abstract
An apparatus comprising a near infrared (NIR) spectrometer and a processor with an algorithm configured to acquire NIR spectral data and perform a chemometric data manipulation provides direct measurement of the etch rate for semiconductor wafer etchant solutions. The apparatus may also provide the concentrations of species in etchant and cleaning solutions, and automated process control. The apparatus may be used for analysis and control of other processing solutions.
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