NANO-IMPRINTING MOLD, METHOD OF MANUFACTURE OF NANO-IMPRINTING MOLD, AND RECORDING MEDIUM MANUFACTURED WITH NANO-IMPRINTING MOLD
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United States of America Patent
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Issued Date -
Aug 7, 2008
app pub date -
Nov 19, 2007
filing date -
Nov 17, 2006
priority date (Note) -
Abandoned
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Abstract
A mold is provide which, by using nano-imprinting, enables inexpensive provision of a magnetic recording medium capable of providing signals with a high signal intensity and enabling a high S/N. The method of the mold used in nano-imprinting includes: a transfer process of pressing a parent mold, having a relief pattern, against a resist layer formed on the surface of a substrate, and then releasing the parent mold to transfer the relief pattern to the resist layer; and a relief pattern formation process of exposing a lower substrate in depression portions of the resist in which the relief pattern has been formed by the transfer process, and etching the exposed substrate to form a relief pattern in the substrate, wherein in the relief pattern formation process, side etching of the substrate is performed during substrate etching.
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