MATERIAL MIXTURE, SPUTTER TARGET AND METHOD FOR PRODUCING A SPUTTER TARGET
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United States of America Patent
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app pub date -
Apr 11, 2008
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Oct 12, 2005
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Abandoned
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Abstract
A material mixture is produced having a cobalt-based alloy as the predominant component and an additional component of at least TiO.sub.x. The material mixture may be formed into a sputter target by hot pressing.
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