Inner lining structure for photoresistant collecting devices
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United States of America Patent
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Issued Date -
Jul 24, 2008
app pub date -
Jan 18, 2007
filing date -
Jan 18, 2007
priority date (Note) -
Abandoned
status (Latency Note)
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Abstract
An inner lining structure for a photoresistant collecting device includes a body, a receiving groove and a through-hole. A periphery of the body is a circular arced surface. A receiving groove is formed by concaving a top of the body downwards and the upper end is shaped like an opening. A through-hole is arranged in a center of the body and penetrates a bottom surface of the receiving groove and a bottom of the body. Based on the above assembly, the present invention engages with a sucking plate of a photoresistant coater and ensures that photoresistant filaments cannot adhere to the bottom of a wafer when the wafer is operated at a high speed.
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