MEMS structure using carbon dioxide and method of fabrication

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United States of America Patent

APP PUB NO 20080169521A1
SERIAL NO

11652631

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Abstract

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A MEMS device is encapsulated in a carbon dioxide environment, which effectively insulates the MEMS device against arcing in high voltage applications. The carbon dioxide environment may have a pressure of between about 0.2 atm and about 4 atm. Carbon dioxide is shown to be more effective than other insulating gases such as sulfur hexafluoride in preventing arcing for applications having dimensions on the order of microns.

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Patent Owner(s)

Patent OwnerAddress
INOVATIVE MICRO TECHNOLOGY75 ROBIN HILL ROAD GOLETA CA 93117

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Foster, John S Santa Barbara, CA 73 1224
Paranjpye, Alok Santa Barbara, CA 12 150
Summers, Jeffery F Santa Barbara, CA 29 263
Thompson, Douglas L Santa Barbara, CA 14 121

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