Nanoimprinting composition
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
N/A
Issued Date -
Jul 10, 2008
app pub date -
Jun 27, 2007
filing date -
Jun 29, 2006
priority date (Note) -
Abandoned
status (Latency Note)
Importance
Abstract
The invention provides a nanoimprinting composition that has good heat resistance and with which a relief pattern that has been formed is not readily eliminated by heating. A relief pattern can be formed easily and efficiently in this nanoimprinting composition. This is accomplished by a nanoimprinting composition including a polyamic acid (B) and an epoxy resin (C), and also accomplished by a nanoimprinting composition including a polyester-polyamic acid (A1) and an epoxy resin (C).
First Claim
Family
International Classification(s)
Cited Art Landscape
Patent Citation Ranking
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully