APPARATUS FOR GAS HANDLING IN VACUUM PROCESSES
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United States of America Patent
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Issued Date -
Jul 10, 2008
app pub date -
Jan 3, 2008
filing date -
Jan 4, 2007
priority date (Note) -
Abandoned
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Abstract
In an apparatus for controlling a gas-rise pattern in a vacuum treatment process a gas inlet (1) is operatively connected with a mass-flow-controller MFC (2); said MFC (2) being again operatively connected via a first valve (5) with a vacuum chamber (3) and in parallel via second valve (6) with a vent-line (4). Said connection with the vent-line (4) further comprises means for varying the pump cross section of said vent-line (4). In another embodiment the apparatus for controlling a gas-rise pattern in a vacuum treatment process comprises a gas inlet (13) operatively connected with a vacuum chamber (3) via a valve (11), wherein the connection between gas inlet (13) and valve (11) further comprises a diaphragm (12).
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