Euv Light Source
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United States of America Patent
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Issued Date -
Jun 26, 2008
app pub date -
Aug 19, 2004
filing date -
Aug 25, 2003
priority date (Note) -
Abandoned
status (Latency Note)
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Abstract
An EUV light source having a simple structure which is capable of generating EUV stably with a sufficient intensity and serves as an alternative to a laser plasma light source. The EUV light source comprises an X-ray tube (1) having a primary target, and a secondary target (4) being irradiated with X-rays (2) emitted from the X-ray tube (1). The secondary target (4) generates fluorescence X-rays (5) selected from a group of BeK.alpha. line, Si-L line and Al-L line.
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