ADJUSTABLE APERTURE ELEMENT FOR PARTICLE BEAM DEVICE, METHOD OF OPERATING AND MANUFACTURING THEREOF
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United States of America Patent
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Issued Date -
Jun 12, 2008
app pub date -
Oct 24, 2007
filing date -
Oct 25, 2006
priority date (Note) -
Abandoned
status (Latency Note)
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Abstract
A charged particle beam device is provided. The device includes an emitter for emitting a charged particle beam in a propagation direction essentially along an optical axis of the charged particle beam device, an aperture arrangement within the charged particle beam device. The aperture arrangement includes a first aperture element having a recess of the first aperture element, the first aperture element being movable in a first direction and with respect to the optical axis, a second aperture element having a recess of the second aperture element, the second aperture element being movable in essentially the first direction and with respect to the optical axis, a holder for holding the first aperture element and the second aperture element, a motion element adapted to move the first aperture element and the second aperture element with respect to the optical axis, and wherein the first aperture element and the second aperture element are displaced with respect to each other along the propagation direction, wherein the first aperture element and the second aperture element are movable in the first direction such that the recess of the first aperture element and the recess of the second aperture element form an aperture opening of a variable size.
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