Lateral-flow waste gas treatment device using nonthermal plasma

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United States of America Patent

APP PUB NO 20080131333A1
SERIAL NO

11607890

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Abstract

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A lateral-flow dielectric barrier discharging reactor unit is designed to effectively process waste gas. Nonthermal plasma is obtained through high voltage gas breakdown for processing the waste gas. Reactor units can be arranged and integrated in a serial and/or parallel way with flow uniformity and smoothness for processing a great amount of waste gas with merits of simplicity and low cost.

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Patent OwnerAddress
ATOMIC ENERGY COUNCIL-INSTITUTE OF NUCLEAR ENERGY RESEARCHNO 1000 WUNHUA RD JIAAN VILLAGE LONGTAN TOWNSHIP TAOYUAN COUNTY

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Chen, Shiaw-Huei Yonghe City, TW 8 16
Tzeng, Chin-Ching Yonghe City, TW 25 75

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