Planar etching of dissimilar materials

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United States of America Patent

APP PUB NO 20080113455A1
SERIAL NO

11823565

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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A method of planar etching of dissimilar materials with a Focused Ion Beam (FIB) system such as the OptiFIB manufactured by Credence Systems. The method includes adjusting the selectivity between the two materials, which varies when the ratio of the assisting chemistry pressure to the ion dose rate changes. This method can be used in such applications as FIB circuit edit, failure analysis, and cross sectioning.

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Patent Owner(s)

Patent OwnerAddress
DCG SYSTEMS INC45900 NORTHPORT LOOP EAST FREMONT CA 94538

International Classification(s)

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  • 2007 Application Filing Year
  • H01L Class
  • 14819 Applications Filed
  • 10455 Patents Issued To-Date
  • 70.56 % Issued To-Date
Click to zoom InYear of Issuance% of Matters IssuedCumulative IssuancesYearly Issuances20072008200920102011201220132014201520162017201820192020202120220255075100

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Jain, Rajesh San Jose, CA 78 859
Makarov, Vladimir Fremont, CA 47 483
Malik, Tahir Fremont, CA 4 35

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Patent Citation Ranking

  • 6 Citation Count
  • H01L Class
  • 1.99 % this patent is cited more than
  • 17 Age
Citation count rangeNumber of patents cited in rangeNumber of patents cited in various citation count ranges741460848475278170928147343412001 - 1011 - 2021 - 3031 - 4041 - 5051 - 6061 - 7071 - 8081 - 9091 - 100100 +01002003004005006007008009001000110012001300140015001600

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