Surface processing apparatus

Number of patents in Portfolio can not be more than 2000

United States of America Patent

SERIAL NO

12003456

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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This surface processing apparatus has a reactor in which plasma is generated and a substrate whose surface is to be processed by the plasma is arranged, and a magnet plate for creating a point-cusp magnetic field distributed in an inner space of the reactor, in which the plasma is generated. The magnet plate has a plurality of magnets. These magnets are arranged by a honeycomb lattice structure in a circular plane facing in parallel a surface of the substrate. One magnetic pole end face of each of magnets is arranged at a position of each of the lattice points forming hexagonal shapes on the circular plane. The polarities of the magnetic pole end faces of two adjoining magnets are arranged to become opposite alternately. The magnet plate may be provided with a plurality of magnets arranged by a lattice structure forming a square and the magnetic force (coercive force) of some of the magnets arranged at the outermost region is reduced. Thereby, the periodicity of the point-cusp magnetic field in the inside space is maintained as much as possible even at the peripheral edge and the asymmetry of the distribution of the magnetic field at the region where the periodicity is disturbed at the peripheral edge is reduced.

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Patent Owner(s)

Patent OwnerAddress
ANELVA CORPORATION8-1 YOTSUYA 5-CHOME FUCHU-SHI TOKYO

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Egami, Akihiro Ebina-shi, JP 15 48
Ikeda, Masayoshi Hachioji-shi, JP 43 797
Nakagawa, Yukito Tachikawa-shi, JP 20 263
Sago, Yasumi Tachikawa-shi, JP 27 721

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