Polyurethane dispersions containing POSS nanoparticles
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
N/A
Issued Date -
May 8, 2008
app pub date -
Nov 6, 2006
filing date -
Nov 6, 2006
priority date (Note) -
Abandoned
status (Latency Note)
Importance
Abstract
A process for forming a polyurethane dispersion containing polyhedral oligomeric silsesquioxane (POSS) nanoparticles, comprising reacting a POSS with a diisocyanate in the presence of acetone, reacting the resulting compound with a polyol and an ionic compound selected from the group consisting of an acidic diol or sodium sulfonate to form an isocyanate prepolymer chain, extending the isocyanate prepolymer chain by adding a diol, and forming an aqueous dispersion. Also, a polyurethane dispersion or film comprising a homogeneously distributed polyurethane bound POSS prepolymer.
First Claim
Family
International Classification(s)
Cited Art Landscape
Patent Citation Ranking
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully