Titanium oxide-based sputtering target for transparent conductive film, method for producing such film and composition for use therein
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United States of America Patent
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Issued Date -
Apr 17, 2008
app pub date -
Oct 13, 2006
filing date -
Oct 13, 2006
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Abandoned
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Abstract
The present invention is directed to a composition consisting essentially of: a) from about 80 to about 99 mole % of TiO.sub.2, and b) from about 1 to about 20 mole % of one or more materials selected from the group consisting of i) WO.sub.2, ii) Ta.sub.2O.sub.5, iii) Nb.sub.2O.sub.5, iv) MoO.sub.2, v) Mo, vi) Ta, vii) Nb, viii) W and ix) mixtures thereof,wherein the mole % s are based on the total product and wherein the sum of components a) and b) is 100. The invention is also directed to the sintered product of such composition, a sputtering target made from the sintered product and a transparent electroconductive film made from the composition.
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