RF Coil Plasma Generation
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United States of America Patent
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Issued Date -
Apr 3, 2008
app pub date -
Sep 29, 2006
filing date -
Sep 29, 2006
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Abandoned
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Abstract
Methods of operating a plasma chamber for use with an electron or ion beam apparatus. The method may comprise igniting a plasma in the plasma chamber by utilizing a first radio frequency (RF) power and a first plasma chamber pressure. The plasma may then be maintained by utilizing a second RF power and a second plasma chamber pressure, wherein the second RF power is substantially less than the first RF power and the second plasma chamber pressure is substantially greater than the first plasma chamber pressure.
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