RF Coil Plasma Generation
Number of patents in Portfolio can not be more than 2000
United States of America Patent
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N/A
Issued Date -
Apr 3, 2008
app pub date -
Sep 29, 2006
filing date -
Sep 29, 2006
priority date (Note) -
Abandoned
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Abstract
Apparatus comprising a plasma chamber, a radio frequency (RF) power source, and a coil centrally disposed in the plasma chamber. The plasma chamber is configured to generate plasma that feeds a vacuum chamber adjacent the plasma chamber, and a first end of the coil is electrically coupled to the RF power source while a second end of the coil is electrically open.
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