Plasma Nozzle Array for Providing Uniform Scalable Microwave Plasma Generation
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United States of America Patent
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Issued Date -
Mar 27, 2008
app pub date -
Jul 21, 2005
filing date -
Jul 30, 2004
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Abandoned
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Abstract
The present invention provides microwave plasma nozzle array systems (10, 70, 230, and 310) and methods for configuring microwave plasma nozzle arrays (37, 99, and 337). The microwaves are transmitted to a microwave cavity (323) in a specific manner and form an interference pattern (66) that includes high-energy regions (69) within the microwave cavity (32). The high-energy regions (69) are controlled by the phases and the wavelengths of the microwaves. A plurality of nozzle elements (36) is provided in the array (37). Each of the nozzle elements (36) has a portion (116) partially disposed in the microwave cavity (32) and receives a gas for passing therethrough. The nozzle elements (36) receive microwave energy from one of the high-energy regions (69). Each of the nozzle elements (36) includes a rod-shaped conductor (114) having a tip (117) that focuses on the microwaves and a plasma (38) is then generated using the received gas.
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