Decomposable resin composition and pattern-forming material including the same

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May 18, 2010
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Aug 30, 2007
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Aug 30, 2006

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Abstract

A decomposable resin composition contains a base generator, and a polyurethane resin capable of being decomposed with a base generated from the base generator.

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Patent Owner(s)

Patent Owner	Address
FUJIFILM CORPORATION	26-30 NISHIAZABU 2-CHOME MINATO-KU TOKYO 106-8620

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G03C:PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES....

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Inventor Name	Address	# of filed Patents	Total Citations
Taguchi, Yoshinori	Haibara-gun, JP	110	1058

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Decomposable resin composition and pattern-forming material including the same

Number of patents in Portfolio can not be more than 2000

United States of America Patent

11847572

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US Family Size	Non-US Coverage
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DATE PUBLISHED	PUBLICATION/PATENT NO.	PUBLICATION TYPE
May 18, 2010	US,7718343,B2 US7718343B2	GRANTED PATENT AS SECOND PUBLICATION
March 20, 2008	US,20080070154,A1 US20080070154A1	FIRST PUBLISHED PATENT APPLICATION

PATENT NO	7718343
SERIAL NO	11847572
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11847572

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