PHOTO-CURABLE RESIN COMPOSITION, METHOD OF PATTERNING THE SAME, AND INK JET HEAD AND METHOD OF FABRICATING THE SAME
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United States of America Patent
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app pub date -
Sep 6, 2007
filing date -
May 14, 2004
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Abandoned
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Abstract
A photo-curable resin composition, a method of patterning the same, an ink jet head, and a method of fabricating the same. The photo-curable resin composition includes an epoxy compound, a photo-catalyst provided as a photo-initiator, and a non-photo reactive solvent. The photo-catalyst may be a semiconductor material to generate electron-hall pairs using light energy. The semiconductor material is one selected from a group consisting of TiO.sub.2, CdS, Si, SrTiO.sub.3, WO, ZnO, SnO.sub.2, CdSe and CdTe, CdSe and CdTe. The epoxy compound may include a di-functional epoxy compound and a multi-functional epoxy compound. The non-photo reactive solvent may be one or a mixture selected from a group consisting of gamma-butyrolactone (GBL), cyclopentanone, C1-6 acetate, tetrahydrofurane (THF), and xylene. The photo-curable resin composition is patterned to form a fluid channel structure of the ink jet head.
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