Ion implantation device
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United States of America Patent
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Mar 31, 2009
Grant Date -
Mar 6, 2008
app pub date -
Nov 14, 2005
filing date -
Nov 19, 2004
priority date (Note) -
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Abstract
To provide an ion implantation device which suppresses diffusion of an ion beam, can finely control a scanning waveform and can obtain a large scanning angle of about 10°.A which applies an electric potential having desired scanning waveform.
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