Plasma generation apparatus and workpiece processing apparatus using the same

Number of patents in Portfolio can not be more than 2000

United States of America Patent

APP PUB NO 20080053988A1
SERIAL NO

11895706

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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Disclosed is a plasma generation apparatus, which comprises a microwave generation section adapted to generate a microwave, a gas supply section adapted to supply a gas to be plasmatized, a plasma generation nozzle which is provided with an inner electrode adapted to receive the microwave and an outer electrode concentrically disposed outside the inner electrode, and adapted to plasmatize the gas supplied from the gas supply section thereinto, based on energy of the microwave, and emit the plasmatized gas from a distal end thereof; and an adapter attached to the distal end of the plasma generation nozzle. In the plasma generation apparatus, the inner and outer electrodes of the plasma generation nozzle are disposed to allow a glow discharge to be induced therebetween so as to plasmatize the gas in a space defined therebetween, and, according to a new supply of the gas into the space, emit the plasmatized gas under atmospheric pressures from a ring-shaped spout of the space in the distal end of the plasma generation nozzle. The adapter is adapted to convert the ring-shaped spout to a lengthwise spout thereof.

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Patent Owner(s)

Patent OwnerAddress
SAIAN CORPORATION579-1 UMEHARA WAKAYAMA-SHI WAKAYAMA 640-8550

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Arai, Kiyotaka Wakayama-shi, JP 24 517
Hayashi, Hirofumi Wakayama-shi, JP 36 249
Iwasaki, Ryuichi Wakayama-shi, JP 15 78
Mankawa, Hirofumi Wakayama-shi, JP 6 50
Masuda, Shigeru Wakayama-shi, JP 42 297
Matsuuchi, Hidetaka Wakayama-shi, JP 5 34
Mike, Masaaki Wakayama-shi, JP 10 64
Yoshida, Kazuhiro Wakayama-shi, JP 333 2369

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