Multi-level optical structure and method of manufacture
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United States of America Patent
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app pub date -
Aug 13, 2007
filing date -
May 9, 2000
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Abandoned
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Abstract
A multi-level optical device includes a substrate having a baseline level. At least one feature is disposed at a level above the baseline level. At least one feature is disposed at a level below the baseline level, or in the feature above the baseline level is located at a distance apart from the feature below the baseline level. The distance has an accuracy inn the range of approximately .+-.0.05 .mu.m to less than approximately .+-.1.0 .mu.m. A method of fabricating an optical device includes forming at least one feature at a level of above a baseline level of a substrate; and forming at least one feature at a baseline level below the baseline level of the substrate, wherein the feature at a level above the baseline level and the feature at a level below the baseline level are patterned in a single-mask step using a multi-level mask.
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