Semiconductor drying process apparatus
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United States of America Patent
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Issued Date -
Feb 28, 2008
app pub date -
Aug 24, 2006
filing date -
Aug 24, 2006
priority date (Note) -
Abandoned
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Abstract
A semiconductor drying process apparatus comprising a processing chamber; two or more inlet/outlet openings formed in the processing chamber; a first pipe member coupled in fluid communication between one or more of the inlet/outlet openings of the processing chamber and a first drain valve; a second pipe member coupled in fluid communication between one or more other ones of the inlet/outlet openings of the processing chamber and a first supply valve; and wherein the first pipe member is coupled in fluid communication to the second pipe member for increasing the flow capacity of the semiconductor drying process apparatus.
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