Silsesquioxane compound mixture, method of making, resist composition, and patterning process

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United States of America Patent

SERIAL NO

11882664

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Abstract

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A silsesquioxane compound mixture having a high proportion of silsesquioxane compounds bearing bulky substituent groups on side chain and having a degree of condensation of substantially 100% is prepared by a first stage wherein a silane feed comprising a trifunctional silane bearing a bulky substituent group on side chain represented by formula (1): wherein Y is an aliphatic or aromatic organic group optionally having a functional group, X.sup.1, X.sup.2 and X.sup.3 are H, halogen, alkoxy or aryloxy is hydrolyzed in the presence of an acid or base catalyst, and a second stage wherein dehydrating condensation is carried out in the presence of a strong base catalyst while removing the water resulting from condensation out of the reaction system.

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Patent Owner(s)

Patent OwnerAddress
SHIN-ETSU CHEMICAL CO LTDJAPAN

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Hamada, Yoshitaka Joetsu-shi, JP 69 1141
Nakashima, Mutsuo Joetsu-shi, JP 73 883

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