Novel resins and photoresist compositions comprising same
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United States of America Patent
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app pub date -
Jul 13, 2007
filing date -
May 30, 2002
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Abandoned
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Abstract
Provided are new resins that comprise carbocyclic aryl units with hetero substitution units and photoresists that contain such resins. Particularly preferred photoresists of the invention comprise a deblocking resin that contains hydroxy naphthyl units and can be effectively imaged with sub-200 nm radiation such as 193 nm radiation.
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