Reticle holding member, reticle stage, exposure apparatus, projection-exposure method and device manufacturing method
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United States of America Patent
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Issued Date -
Jan 31, 2008
app pub date -
Jul 10, 2007
filing date -
Jul 11, 2006
priority date (Note) -
Abandoned
status (Latency Note)
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Abstract
Reticle-holding members are disclosed that prevent a reticle from falling from the reticle stage of an exposure device, even in event of a power failure, and that maintain flatness of the reticle surface on which the pattern is formed. In an exemplary configuration a reticle-holding member is configured to hold a reticle and is configured so that at least part of its edge portion projects beyond the reticle. The projecting edge portion is supported and mounted on the reticle stage of the exposure system.
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