Sputtering apparatus including novel target mounting and/or control
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United States of America Patent
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app pub date -
Jul 12, 2006
filing date -
Jul 12, 2006
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Abstract
A sputtering chamber includes at least two sputtering targets, one of the at least two targets disposed on a first side a substrate conveyor extending within the chamber, and another of the at least two targets disposed on a second side of the conveyor. The at least two targets may be independently operable, and at least one of the targets, if inactivated, may be protected by a shielding apparatus. Both of the at least two targets may be mounted to a first wall of a plurality of walls enclosing the sputtering chamber.
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