Process For Producing Aluminum Nitride Crystal And Aluminum Nitride Crystal Obtained Thereby

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United States of America Patent

APP PUB NO 20080008642A1
SERIAL NO

11661013

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Abstract

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The present invention provides a method for producing aluminum nitride crystals under mild pressure and temperature conditions. In the production method of aluminum nitride crystals, aluminum nitride crystals are formed and grown in the presence of nitrogen-containing gas by allowing aluminum and the nitrogen to react with each other in a flux containing the following component (A) and component (B), or a flux containing the following component (B). (A) At least one element selected from the group consisting of the alkali metal and the alkaline-earth metal. (B) At least one element selected from the group consisting of tin (Sn), gallium (Ga), indium (In), bismuth (Bi) and mercury (Hg).

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Patent Owner(s)

Patent OwnerAddress
OSAKA UNIVERSITYSUITA CITY OSAKA-FU

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Isobe, Hiroaki Osaka, JP 18 85
Kawahara, Minoru Osaka, JP 45 371
Kawamura, Fumio Osaka, JP 87 965
Masashi, Yoshimura Osaka, JP 1 34
Mori, Yusuke Osaka, JP 205 925
Sasaki, Takatamo Osaka, JP 2 49

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