Method For Producing A Photonic Crystal Comprised Of A Material With A High Refractive Index
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United States of America Patent
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Issued Date -
Dec 20, 2007
app pub date -
Aug 5, 2005
filing date -
Aug 5, 2004
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Abandoned
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Abstract
The invention relates to a process for producing a three-dimensional photonic crystal which consists of a material with high refractive index. To this end, a photonic crystal which consists of a polymer is first provided, through whose surface there are empty interstitial sites. As a result of introduction of a filler into the interstitial sites, a network forms there from the filler. After the removal of the polymer, cavities form in the network formed from the filler, into which the material with high refractive index is introduced, so that a structure of the material with high refractive index forms therein. After the removal of the filler, the structure of the material with high refractive index remains, which can be removed as the photonic crystal which consists of a material with high refractive index. Photonic crystals produced by the process according to the invention have complete band gaps in the region of telecommunications wavelengths.
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