Optical method to monitor nano thin-film surface structure and thickness thereof
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United States of America Patent
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Issued Date -
Dec 6, 2007
app pub date -
May 31, 2006
filing date -
May 31, 2006
priority date (Note) -
Abandoned
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Abstract
A method to monitor a nanocrystalline film surface structure and the thickness thereof uses the surface structure characteristics of the vapor deposition nanocrystalline thin films having the low volume fraction to make a nanocrystalline thin film become a nonhomogeneous double-layer structure comprising a dense bottom layer having high index of refraction and a surface layer having the low volume fraction. The optical module of this double-layer structure can be used to simulate the characteristics of the nanocrystalline structure. That is to say, in the thin film deposition manufacturing process, if the thin film structure satisfies the optical module of the double-layer structure, this means it has the nanocrystalline characteristic. Hence, in the manufacturing process, use the optical instruments to measure the thin film and the substrate and to calculate the optical parameters; thus a nanocrystalline film surface structure and the thickness thereof can be precisely monitored immediately.
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