Device for Controlling Electron Temperature in an Ecr Plasma
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United States of America Patent
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Issued Date -
Nov 22, 2007
app pub date -
Nov 3, 2004
filing date -
Nov 4, 2003
priority date (Note) -
Abandoned
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Abstract
A device which is used to control the electronic temperature in an ECR plasma chamber includes at least one moderator which is placed in the path of electrons having an energy greater than a pre-determined energy, so as to form an obstacle to the electrons. The invention is suitable for use in ion sources and plasma machines.
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