Importance

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Abstract

An object of the invention is to obtain a diffusive reflecting structure showing a desired reflection directivity with ease and stability. The manufacturing method for a diffusive reflecting structure comprises: depositing a photosensitive material (2) on a base layer; masking the photosensitive material (2) using a halftone mask (3) having at least one of transmissive area (31) and light shield area (32) and having a semitransmissive area (33); forming unevenness (21, 22) on a surface of a layer of the photosensitive material by exposing the photosensitive material to light through the mask (3) and developing the material, the unevenness corresponding to peak portions corresponding to the one of the areas (31, 32) and halfway portions corresponding to the semitransmissive area; and depositing an optical reflecting material (4) on the formed uneven surface. The mask (3) comprises a stripe arrangement portion in the one or both of the transmissive area (31) and light shield area (32) and/or in the semitransmissive area (33) in order to transmit the incident light at a gray scale, the stripe arrangement portion having first linear parts (34) capable of transmitting incident light at a relatively high first transmittance and second linear parts (35) capable of intercepting incident light at a relatively low second transmittance, the first linear parts (34) and the second linear parts (35) being placed in parallel with each other alternately. A surface of a layer of the photosensitive material (2), corresponding to the stripe arrangement portion, is provided with small-scale bottom portions corresponding to ones (34) of the first and second linear parts and small-scale peak portions corresponding to the others (35).

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First Claim