Magnetron cathode and sputtering device installing it
Number of patents in Portfolio can not be more than 2000
United States of America Patent
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N/A
Issued Date -
Nov 15, 2007
app pub date -
May 2, 2007
filing date -
May 9, 2006
priority date (Note) -
Abandoned
status (Latency Note)
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Abstract
The present invention provides a magnetron cathode comprising a circular inner target and an outer target provided outside said inner target and concentrically to said inner target, wherein an outer magnet unit positioned behind said outer target, immovable against a back panel portion for outer target holding said outer target, and comprising an magnet group for outer target and an outer yoke on which said magnet group for outer target is fixed, an inner magnet unit positioned behind said inner target, provided movably and rotatably on a back panel portion for inner target, and comprising an magnet group for inner target and an inner yoke on which said magnet group for inner target is fixed, a movement control means for moving said inner magnet unit to said inner target; and a rotation control means for rotating said inner magnet unit to said inner target are provided, so that improvement of distribution and uniformity of erosion of the targets are achieved and further increase of availability and life of the targets are achieved.
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