DEVICE AND METHOD OF FORMING NANOIMPRINTED STRUCTURES
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United States of America Patent
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Issued Date -
Nov 8, 2007
app pub date -
May 5, 2006
filing date -
May 5, 2006
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Abandoned
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Abstract
A novel method of forming a nanostructure device is provided. A master having a nanostructure layer is used to make an intermediate replica. The intermediate replica includes a pattern layer and a buffer layer, both made from viscous material. The depth of the buffer layer is at least ten times greater than the depth of the pattern layer such that the buffer layer absorbs any dust particles that may be present. The intermediate replica, rather than the master, is then used to make the final nanostructure device.
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